Abstract
In this paper, a low-cost and high-throughput method for fabrication of large area ordered nanostructure is presented and the obtained structures are characterized using SEM stereoscopic technique for 3D-reconstruction of nanostructures to calculate the surface properties. The results show two kinds of deformations, including narrow waves of the surface, due to the embedment of nanospheres to the photoresist, and irregular ups and downs in surface structure, which could be caused by fabrication process faults. This approach provides a simple and efficient way to measure the morphological parameters in flat nanometre-sized structures. (C) 2010 Elsevier B.V. All rights reserved.
Original language | English |
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Pages (from-to) | 2687-2690 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 88 |
Issue number | 8 |
DOIs | |
Publication status | Published - 1 Aug 2011 |
Keywords
- SEM stereoscopic technique
- Nanosphere photolithography
- 3D-reconstruction
- Nanostructures