A Fullerene derivative as an electron beam resist for nanolithography

A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, J.A. Preece

Research output: Contribution to journalArticlepeer-review

71 Citations (Scopus)
Original languageUndefined/Unknown
JournalApplied Physics Letters
DOIs
Publication statusPublished - 1998

Cite this