Project Details
| Short title | IAA 2012 - FOF: A Fullerene Resist to Enable Next Generation Semiconductor Fabrication |
|---|---|
| Status | Finished |
| Effective start/end date | 1/04/13 → 31/03/14 |
Funding
- Engineering & Physical Science Research Council
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Research output
- 1 Article
-
Chemically amplified phenolic fullerene electron beam resist
Yang, D., Frommhold, A., Xue, X., Palmer, R. E. & Robinson, A., 28 Feb 2014, In: Journal of Materials Chemistry C. 2, 8, p. 1505-1512Research output: Contribution to journal › Article › peer-review
Open AccessFile18 Citations (Scopus)372 Downloads (Pure)