Fullerene Chemically Amplifield Resists for Next Generation Lithography : Proof of Concept & Knowledge Transfer Project - (KTP Funded via Loughborough University)

Project Details

Short titleFullerene Chemically Amplifield Resists for Next Generation Lithography : Proof of Concept & Knowledge Transfer Project - (KTP Funded via Loughborough University)
StatusFinished
Effective start/end date1/09/09 → 30/11/09

Funding

  • Engineering & Physical Science Research Council