EPSRC/FSE Collaboration ref APGR/EPSRC-10-1 - Next Generation Resist Technology for the Semiconductor Industry

Research output

Research output per year 2012 2012 2012

• 2 Article
• 1 Conference contribution

Research output per year

Research output per year

Search results

• 2012

  Fullerene-based spin-on-carbon hardmask

  Frommhold, A., Manyam, J., Palmer, R. E. & Robinson, A. P. G., 1 Oct 2012, In: Microelectronic Engineering. 98, p. 552-555

  Research output: Contribution to journal › Article › peer-review

  Open Access

  File

  • fullerenes 100%
  • carbon 63%
  • photoresists 50%
  • oxygen plasma 28%
  • plasma etching 27%
  14 Citations (Scopus)

  295 Downloads (Pure)

• High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

  Robinson, A., 2012, In: Proceedings of SPIE - The International Society for Optical Engineering. 8328, p. n/a 8328OU.

  Research output: Contribution to journal › Article › peer-review
  11 Citations (Scopus)